Coaxial Power Systems Ltd

VACUUM PROCESSES (1)
CHEMICAL VAPOUR DEPOSITION

Plasma enhanced CVD systems for thin films of silicon nitride and silicon dioxide etc.

 Plasma enhanced CVD systems for thin films of silicon nitride & silicon dioxide etc. - click here for full specification.
MICROWAVE ASSISTED CHEMICAL VAPOUR DEPOSITION

MACVD systems for diamond film deposition.

 

ASHING SYSTEMS

Barrel Ashing Systems with chambers from 100mm to 450mm diameter, for the removal of photoresist, surface treatment of plastics (Hydrophillisation) and chemical analysis of carbon compounds.

 

 

ETCHING SYSTEMS

Custom designed systems for plasma and reactive ion etching of thin films.

 Barrel Ashing Systems with chambers from 100mm to 450 mm diameter and Custom designed systems for plasma and reactive ion etching of thin films - click here for full specification.
Home Page